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  6. Silicon wafer dedicated oxygen analysis device 'O836Si'

Silicon wafer dedicated oxygen analysis device 'O836Si'

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last updated:Apr 13, 2021

LECOジャパン
LECOジャパン
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Introducing a high-precision oxygen analysis device that adopts a non-dispersive infrared detection method!

The "O836Si" is an oxygen analysis device specifically designed for silicon wafers, developed to meet the demand for low concentration and high precision oxygen analysis in the silicon industry. It enables accurate and high-precision oxygen analysis through the combination of a highly precise non-dispersive infrared detector, the latest sample loading system, and a programmable impulse furnace. Additionally, it adopts a Windows-based system, achieving high operability. 【Features】 ■ High-precision solid-state infrared detector for low concentrations ■ Low system blank and loading head design for wafer measurement ■ Measurement results can also be displayed in ppma ■ Windows-based operating system ■ Capable of analyzing metals such as silicon wafers and steel *For more details, please feel free to contact us.

    Analytical Equipment and Devices
O836si.png

Silicon wafer dedicated oxygen analysis device 'O836Si'

O836si.png
O836si.png
  • Related Link - https://www.leco.co.jp/products/inorganic/o836Si/

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【Specifications】 ■Analysis Range (Sample 0.3g): 0.1ppm – 500ppm ■Analysis Accuracy (Sample 0.3g): Standard Deviation (s) 0.05ppm or RSD 0.3% ■Calibration: Standard Sample / Single Point or Multi-Point / Manual / Gas Dose ■Sample Weight & Dimensions: Typically 1.0g, 0.25g – 0.70g (Silicon Analysis) ■Detection Method: Non-Dispersive Infrared Detection Method ■Reagents  ・Magnesium Perchlorate  ・Rare Earth-Based Copper Oxide, Reduced Copper  ・Sodium Hydroxide (Coated on Inert Substrate)  ・Oxygen Moisture Removal Reagent (OMI Tube) ■Used Gases  ・Carrier Gas: Helium 99.99%, 0.15MPa±5%          Argon 99.999%, 0.15MPa±5%  ・Driving Gas: Compressed Air or Nitrogen (Free of Moisture and Oil), 0.28MPa±10%  ・Gas Dose: Carbon Dioxide 99.99%, 0.14MPa±10% ■Dimensions/Weight: 91.5(H)cm × 71(W)cm × 76(D)cm / 186kg *For more details, please feel free to contact us.

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LECOジャパン

LECOジャパン

Testing, Analysis and Measurement

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LECO Corporation in the United States has been meeting the expectations of the development of materials and quality control analysis in various industrial products since 1936. In particular, in the field of carbon, sulfur, oxygen, nitrogen, and hydrogen analysis in metallic materials, it holds an overwhelming market share and can provide analytical values that ensure sufficient reliability for global transactions. Additionally, the application of these analytical techniques has been recognized in various fields, such as elemental analysis of organic substances and nutritional component analysis in food, as convenient, safe, and more accurate methods. Furthermore, in the field of mass spectrometry, as a pioneer of time-of-flight mass spectrometry (TOF-MS), it has contributed to the accumulation of data that serves as a foothold for cutting-edge research in Europe and the United States. Moving forward, we will continue to strive to contribute to the development of new technologies, productivity, and quality improvement in various fields based on accurate analytical results.

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