User-friendly and powerful lithography simulation software.
"HyperLith(TM)" is software that supports scalar calculations and exact solutions, compatible with EUV and DUV technologies. It predicts the outline of simulation results using the LiveView GUI. Additionally, with the new GDS export feature, you can export a programmed series of patterns to a GDS file, which can be useful for creating test masks. [Features] - Supports Polarization, Aberrations, and Resist - Supports hardware acceleration, parallel processing, and distributed computing capabilities - Supports Windows and Linux - Exports to EM-Suite as .sim files *For more details, please download the PDF or feel free to contact us.
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basic information
【Shape Input Function on Wafer with HyperLith(TM)】 ■ Suitable for double patterning simulation ■ Immersion bubbles, reflective notching, non-planar resist surfaces, underlying structures ■ Calculation of image topography within the resist using TEMPESTpr2 exact solution ■ Hardware acceleration and parallel processing ■ Create and observe structures on the wafer with powerful 3D structure editing capabilities *For more details, please download the PDF or feel free to contact us.
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Intersoft Corporation engages in software sales and utilizes cutting-edge simulation software to eliminate waste in cost and time, enabling high-performance, low-cost product development in a short period. Our company aims to provide simulation software that meets your needs 100% in terms of performance, price, and support.
