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  6. Contracted membrane analysis services | JTL

Contracted membrane analysis services | JTL

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last updated:Jul 22, 2025

JAPAN TESTING LABORATORIES
JAPAN TESTING LABORATORIES
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We will appropriately conduct the analysis of plating, thin films, and multilayer films using a variety of methods.

We conduct observations and analyses of coatings and thin films primarily using four methods: cross-section polishing, ion milling (CP processing), EDX, WDX, and XRF. We accommodate a wide range of materials, including both inorganic and organic substances, from hard films to multilayer films.

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Contracted membrane analysis services | JTL

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  • Related Link - https://jtla.co.jp/service/analysis/

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basic information

**Features** - Cross-section polishing: Observation of 10μm or more After embedding in resin and performing cross-sectioning at specified locations, observation is conducted using an optical microscope or SEM. Polishing without unevenness is possible for film thicknesses of about 10μm or less. If observation of thinner films is desired, ion milling (CP processing) is recommended. - Ion milling (CP processing): Observation at the order of 100nm By performing ion milling (CP processing), observation can be conducted at the order of 100nm. Processing with an ion beam is less affected by differences in material hardness, allowing for very smooth polishing even for composite materials with varying hardness, making it ideal for film thickness observation and analysis. - XRF: Non-destructive observation Non-destructive measurement of thin multilayer film thickness is also possible, with measurements of up to 9 layers. The measurable range for film thickness varies by element but generally ranges from 10nm to 15μm. Additionally, qualitative analysis of thin films is also possible.

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Applications/Examples of results

- Observation of anodized aluminum film 【Ion milling processing】→【FE-SEM observation】 - Au thin film with a thickness of several tens of nm 【Ion milling processing】→【FE-EPMA analysis】 - Film thickness measurement with commercially available screws (cross-sectional polishing comparison) 【XRF】 and 【cross-sectional polishing】→【FE-SEM】 *Regarding the measurement error, cross-sectional polishing observes the film thickness locally, while XRF averages the film thickness information over a certain range for calculation.

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JAPAN

JAPAN TESTING LABORATORIES

Testing, Analysis and Measurement

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Our main business is providing technical services to evaluate the reliability of developed products. We not only provide evaluation data in accordance with standards and regulations, but also propose optimal methods, conditions, and equipment for evaluation purposes, as well as design and manufacture original equipment and jigs for non-standard evaluations. Additionally, we handle three evaluation techniques—measurement, testing, and analysis—comprehensively, allowing us to offer complex services that span diverse equipment and suggest more multifaceted evaluation methods.

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