By combining powerful plasma molecular irradiation with a heater chuck, it removes organic substances that are difficult to eliminate with a standard plasma cleaner.
Features ● High output density downstream plasma treatment ● Heater stage maximum temperature 250℃ ● Control of various gas atmospheres using MFC (up to 4 systems) ● Efficient and low-heat treatment achieved with low-frequency 40kHz plasma power supply (CV200RFS) ● Strip rate CV200RFS: up to 7000Å/min EcoClean: 1.5 to 10μm/min
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Features ● High output density downstream plasma treatment ● Heater stage maximum temperature 250℃ ● Control of various gas atmospheres using MFC (up to 4 systems) ● Efficient and low heating treatment achieved with low frequency 40kHz plasma power supply (CV200RFS) ● Strip rate CV200RFS: up to 7000Å/min EcoClean: 1.5 to 10μm/min
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Features ● High output density downstream plasma treatment ● Heater stage maximum temperature 250℃ ● Control of various gas atmospheres using MFC (up to 4 systems) ● Efficient and low heating processing achieved with a low-frequency 40kHz plasma power supply (CV200RFS) ● Strip rate CV200RFS: up to 7000Å/min EcoClean: 1.5 to 10μm/min
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