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  6. Increase the yield of thermal spraying with 'Thermal Spray Powder SURPREX'

Increase the yield of thermal spraying with 'Thermal Spray Powder SURPREX'

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last updated:Sep 12, 2018

フジミインコーポレーテッド
フジミインコーポレーテッド
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Production of thermal spray powders adjusted to the desired granularity! Achieving high adhesion efficiency while avoiding issues such as spitting. *Free explanatory materials on thermal spray powders.

The thermal spray powder "SURPREX" is produced by granulating multiple fine powders into a shape close to that of pearls, followed by sintering and then adjusting the particle size. As a result, it achieves a higher adhesion efficiency (thermal spray yield) and excellent fluidity compared to powders manufactured by conventional sintering-grinding or melting-grinding methods. 【Selectable Points】 ■ Fewer troubles such as spitting ■ Higher adhesion efficiency than powders produced by conventional sintering methods ■ Capability to produce thermal spray materials from composite reaction products ■ Capability to produce thermal spray powders with adjusted particle size *For more details, please refer to the PDF document or feel free to contact us.

    Plasma surface treatment equipmentothers
溶射粉末.JPG

Increase the yield of thermal spraying with 'Thermal Spray Powder SURPREX'

溶射粉末.JPG
溶射粉末.JPG
  • Related Link - http://www.fujimiinc.co.jp/
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Explanation materials | Increasing the yield of thermal spraying with 'Thermal Spray Powder SURPREX'

Explanation materials | Increasing the yield of thermal spraying with 'Thermal Spray Powder SURPREX'

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フジミインコーポレーテッド

フジミインコーポレーテッド

Electronic Components and Semiconductors

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Fujimi Incorporated has been a pioneer in the precision artificial abrasive materials industry since its founding in 1950, continuing its unique journey by leveraging classification technology and other advancements. The products born from accumulated know-how and research and development capabilities have evolved from polishing materials for optical lenses to essential components in advanced industries requiring high precision, such as mirror polishing of semiconductor substrates represented by silicon wafers, CMP (Chemical Mechanical Planarization) necessary for multilayer wiring of semiconductor chips, and polishing of hard disks for computers. Recently, we have also been actively engaged in the development of polishing and grinding materials for surface processing in fields such as LED, displays, and power electronics, as well as in applied areas utilizing powder technology. Additionally, we provide thermal spray materials for various industries, including steel, aerospace, and semiconductors.

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