A device capable of powdering both organic and inorganic materials due to increased vaporization with a special nozzle.
The "SPM-300 Series" is a film coater suitable for film formation at very low flow rates. It has a high coating efficiency for the applied materials, reducing it to 1/2 compared to conventional spray methods and to less than 1/30 compared to spin methods. Since it applies films in a normal pressure environment, there is no need for vacuum equipment, significantly reducing the costs associated with expensive vacuum systems. Materials containing larger solid particles can be used. Exhaust and waste liquid treatment can be managed with a minimal system compared to conventional systems. It is compatible with weakly acidic, weakly alkaline, and various organic solvents. 【Features】 ■ High coating efficiency for applied materials ■ No need for vacuum equipment as it applies films in a normal pressure environment ■ Can use materials containing larger solid particles ■ Exhaust and waste liquid treatment can be managed with a minimal system compared to conventional systems ■ Compatible with weakly acidic, weakly alkaline, and various organic solvents *For more details, please refer to the PDF document or feel free to contact us.
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【Specifications】 ■ Table Size: 300mm × 300mm ■ Movement Range: Left/Right 400mm × Front/Back 450mm × Up/Down 120mm ■ Device Dimensions: 1000mm (W) × 1000mm (D) × 1650mm (H) ■ Device Weight: Approximately 300Kg ■ Liquid Supply Method: Syringe pump liquid supply system, 1 line, 50ml standard ■ Coating Method: Atomization spray using a 2-fluid nozzle, 1 unit ■ Control: Main control using a sequencer, display switches using a touch panel ・ Coating Speed: 1 to 500mm/sec ・ Atomizing Air Flow Rate Setting: 5 to 12l/min, N2 can be used ・ Chemical Flow Rate Setting: 0.1 to 10ml/min ■ Power Supply: Single-phase AC100V ±10%, 50/60Hz, approximately 1kVA ■ Exhaust: Chamber exhaust: 15m3/min or more, φ150 exhaust ■ Intake: Ventilation non-woven fabric filter installed at the top ■ Operating Air: Air for nozzle supply (N2), connected with 6φ tube, 400kPa or more *For more details, please refer to the PDF document or feel free to contact us.
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【Examples of Device Usage】 ■Automobiles: Lamps, windshields, bumpers, etc. ■Lenses: Hard coatings, anti-reflective films, anti-fog films, etc. ■Solar Cells: TiO2, protective films, colored films, etc. ■Compound Semiconductors: High-brightness LEDs, etc. ■MEMS: Resists, etc. ■Liquid Crystals: Resists, black matrices, MgO, etc. ■Organic EL: Polymers, etc. ■Printed Circuit Boards: Steel film formation, resists, embedding, flattening, etc. *For more details, please refer to the PDF materials or feel free to contact us.
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Company information
Urahano Giken Co., Ltd. specializes in the design and manufacturing of high-pressure related equipment, semiconductor related equipment (electric furnace related, CVD), automatic precision measurement devices, and general automatic control systems. We handle advanced high-pressure nitrogen gas generation devices equipped with a variable pressure control system controller, such as the "CINPRES 1X1VP30R." Please feel free to contact us if you have any inquiries.