High functionality and low price! Equipped with a touch panel full-auto coating feature, all performance has been powered up!
A new type of osmium coater for pre-treatment for electron microscope observation. We have fully automated parts that were previously difficult to operate manually. This represents a new dimension of osmium coating that allows for safer and easier operations. Equipped with a touch panel, it enables simple and clear operation. Anyone can easily create conductive films for electron microscopes. Additionally, we offer a variety of options to enhance safety and functionality. This device has been meticulously designed, yet we have achieved an astonishingly low price. If you are interested in osmium coating or have concerns about operation, please consider our osmium coater. We are also accepting requests for test coating and demonstrations at any time.
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basic information
Features ★ Adopts a low-voltage discharge CVD method using a hollow cathode sample stage (patented), gently coating the sample with metallic osmium. ★ Osmium plasma ions are generated throughout the entire hollow cathode cylinder, so the size and height of the sample do not affect the coating process. ★ Osmium gas is injected only during coating after reaching the optimal vacuum level for plasma discharge, saving the consumption of crystalline osmium (approximately 100 uses per gram). ★ The coating operation is fully automatic. Simply place the sample attached to the SEM stub inside the hollow cathode and press the start switch. ★ Dangerous unreacted osmium gas is removed by an exhaust osmium trap (activated carbon), ensuring no atmospheric pollution. The timing for replacing the activated carbon can be checked on the operation panel. ★ Film thickness control allows for fine adjustments based on time, temperature, and current.
Price range
P5
Delivery Time
Applications/Examples of results
This is a device for generating osmium metal films for electron microscopy observation. It is effective for high-magnification observation and conductive treatment of complex-shaped samples. Since it can create a very thin conductive film on the sample, it is also applicable for X-ray analysis and Auger analysis.
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Company information
We manufacture sputtering devices, deposition devices, plasma irradiation devices, CVD devices, and vacuum components. We offer a lineup of pre-treatment devices for electron microscope sample preparation and small vacuum devices for research and development institutions. We believe it is our company's mission to quickly and affordably supply the necessary equipment development for those active in cutting-edge technology research and development, and to support development by making incremental improvements and modifications during the experimental process. We are involved in the development, commercialization, sales, and service of experimental instruments and devices necessary for new technology development in the fields of semiconductors, biotechnology, environment, and nanotechnology, as well as devices related to electron microscope sample preparation as cutting-edge analytical tools for new technology development.
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