Maximum 200mm diameter substrate! Double ring magnetron (Fraunhofer FEP)
The "scia Magna 200" is a magnetron sputtering device with a rotating single magnetron. Applications include temperature compensation films (SiO2) for TC-SAW, piezoelectric films such as AlN, high and low refractive index films for optics, and insulating films (Si3N4, SiO2, Al2O3). Additionally, the process is magnetron sputtering. Please feel free to consult us when needed. 【Features】 ■ Maximum substrate diameter of 200mm ■ Rotating single magnetron (maximum diameter of 300mm) ■ Confocal 4 magnetron ■ Double ring magnetron (Fraunhofer FEP) *For more details, please refer to the PDF document or feel free to contact us.
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【Applications】 ■ Temperature compensation film for TC-SAW (SiO2) ■ Piezoelectric film such as AlN ■ High and low refractive index films for optics ■ Insulating films (Si3N4, SiO2, Al2O3) *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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