We provide custom-made polishing agents suitable for our customers!
Our "CHEMISTER CL Series" is a polishing agent developed for oxide-based substrates, achieving high polishing rates and surface quality. It targets materials such as lithium tantalate (LiTaO3), which is used for substrates in SAW devices, as well as lithium niobate (LiNbO3), sapphire, zinc oxide, and garnet. 【Features】 - A polishing agent with colloidal silica as the abrasive for mirror polishing. - Achieves high polishing rates and surface quality for difficult-to-process materials such as lithium tantalate (LiTaO3) and sapphire. - Provides customized polishing agents to meet customer needs and requests. *Please feel free to contact us for more details.
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【Other Product List】 ■Polishing agents for hard disks (HD) ■Polishing agents for power semiconductor substrates ■Polishing agents for compound semiconductor substrates ■Polishing agents for various ceramic materials ■Polishing agents for metal materials ■Polishing agents for plastic lenses ■Other polishing agents *For more details, please feel free to contact us.
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Since our establishment in 1985 as an abrasive manufacturer, we have continuously challenged ourselves to innovate in the field of mirror polishing abrasives, honing our technology and accumulating know-how. Our strength lies in our ability to share challenges and quickly and flexibly optimize products to meet the diverse quality requirements of our customers. Additionally, depending on the material to be polished, we utilize our knowledge of materials and formulation technology to design compositions, developing abrasives that achieve high productivity and the highest quality polished surfaces.
![[Solution Case] Development of Tungsten Lures and Materials](https://image.mono.ipros.com/public/product/image/ee9/2000472753/IPROS71595274345371710639.jpeg?w=280&h=280)
