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  6. SDR-type roll-to-roll sputtering device (RtoR type sputtering device)

SDR-type roll-to-roll sputtering device (RtoR type sputtering device)

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SDR-type roll-to-roll sputtering device

last updated:May 13, 2020

神港精機 東京支店
神港精機 東京支店
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Currently responding to sample tests, developing films and metal foils for flexible devices and advanced functional materials, and supporting mass production. Process support with demo equipment.

Achieving mass production of flexible electronic devices represented by FPC with proven results. Reliable response to various individual requirements through process support using in-house demonstration equipment. Proven results with a wide range of substrates, including not only general resin films but also metal foils. Stable operation is realized through a high-utilization cathode developed in-house and a well-established transport mechanism. Equipped with a variety of optional mechanisms such as plasma pre-treatment electrodes, cathodes for magnetic materials, and main rolls for substrate heating, it can be operated as a multipurpose continuous film processing device. Flexible realization of hardware and software according to purpose and application, including small machines for R&D and batch-type equipment compatible with sheets.

    Other processing machinesSputtering EquipmentPlasma surface treatment equipment
SDR型巻取式スパッタリング装置.jpg

SDR-type roll-to-roll sputtering device (RtoR type sputtering device)

SDR型巻取式スパッタリング装置.jpg
SDR型巻取式スパッタリング装置.jpg
  • Special site - Product/service details - https://pr.mono.ipros.com/shinko-seiki/product/

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basic information

Device type: Roll-to-roll magnetron sputtering system Substrate size: Compatible with a maximum width of 1000 mm Number of cathodes: Up to 4 Film types: Metal, magnetic films, reactive oxide films Optional features: Plasma pre-treatment mechanism, ion gun, lamp heater, heating roll, etc.

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Applications/Examples of results

*FPC (Flexible Printed Circuit Board) - Formation of a plated seed layer *Advanced Materials - Formation of a nanocarbon material growth layer - Metallization of carbon fiber surfaces

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Model number overview
SDR8120 Model Compact roll-to-roll sputtering device compatible with substrate widths of 150 to 200 mm, incorporating mechanisms from higher-end models such as various cathodes (for magnetic materials and reactive applications) and pre-treatment systems, multifunctional roll-to-roll sputtering device

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Reel-type plasma treatment device

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Company information

神港精機

神港精機 東京支店

Industrial Machinery

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Shinko Seiki, as a technology-driven manufacturer, leverages the numerous know-how accumulated particularly in the field of vacuum equipment to deliver innovative products that meet user needs. In recent years, the company has also been challenging cutting-edge fields such as electronics and new materials, aiming to develop truly valuable hardware and software through the advancement of distinctive technologies and their organic integration.

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