Proven track record in exhaust for hot CVD equipment. Particularly effective for the exhaust of Cl-based gases, achieving both high-volume exhaust and compatibility with chlorine-based gases. A reliable system that also incorporates gas treatment.
A vacuum pump with a proven track record in chemical processes (water-sealed vacuum pump and mechanical booster) has been integrated into a unit. The pump materials and peripheral equipment are optimized according to the process characteristics, gas types, and exhaust volumes of the CVD equipment. The main exhaust pump is a water-sealed vacuum pump with a liquid circulation system, using an alkaline solution for the circulating sealing liquid, achieving both the exhaust and neutralization of chlorine-based gases. This significantly reduces the load on the downstream gas treatment equipment. It is particularly effective in the exhaust system for chlorine-based gases in thermal CVD equipment for surface treatment, and is widely used in the production of tools, molds, and semiconductor jigs. It can also be applied to the exhaust of chlorine-based gases during Si epitaxial growth and etching. The main pump's water-sealed vacuum pump is also made entirely of stainless steel, providing excellent corrosion resistance in a dedicated vacuum exhaust system.
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basic information
A vacuum pump unit based on the combination of all-stainless steel water-sealed vacuum pumps and mechanical boosters. Optimal combinations can be achieved according to the pressure and exhaust volume used. Features include the multi-stage design of mechanical boosters focused on exhaust volume and flexible options like air ejectors. The system has a proven track record for exhausting particles and chlorine-based gases, depending on the pump's characteristics and materials. A wide range of requirements can be met through a rich combination of pumps. By using rough vacuum pumps (SSH series) for coarse exhaust before film formation, the system can be upgraded to a more reliable one. It can be proposed as an exhaust system that includes a pressure regulation mechanism.
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Applications/Examples of results
Exhaust system for thermal CVD equipment for surface treatment Exhaust system for thermal CVD equipment for cutting tools Exhaust system for thermal CVD equipment for semiconductor device fixture coating
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Company information
Shinkou Seiki, as a technology-driven manufacturer, leverages the numerous know-how accumulated particularly in the field of vacuum equipment to deliver innovative products that meet user needs. In recent years, the company has also been challenging cutting-edge fields such as electronics and new materials, aiming to develop truly valuable hardware and software through the advancement of distinctive technologies and their organic integration.