Wafer size post-process projection exposure equipment MRS adopts UV-LED light source as the standard light source (enabling reduction of running costs without sacrificing productivity!)
■ For 8 inches and below, "single exposure method" is available, while for 12 inches, "step and repeat exposure method" can be selected. ■ Achieves high productivity due to a wide exposure area. ■ Has a deep focal depth, with numerous achievements in the MEMS and RF filter industries. ■ Compatible with TAIKO wafers. ■ Global alignment method. ■ High-precision alignment exposure is achieved with a high-rigidity frame. ■ Focus map mechanism is standard equipment.
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basic information
- Equipment: Exposure machine, projection exposure machine, stepper - Applications: Semiconductor back-end processes, RF filters, power semiconductors, electronic components, packaging, research - Compatible substrates: Wafers (including special wafers) of various sizes, glass, organic substrates, etc. - Lens features: Resolution of 1.5um or higher, 1:1 magnification, wide angle (4 to 8 inches) - Main body: Up to 12 inches, for research use - All light sources are standard LED Additionally, custom design, lens design, manufacturing, and sales, LED light source sales.
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Company information
Starting with printed circuit boards, we provide cutting-edge technology to electronic component manufacturers in Japan through the sale of manufacturing equipment for major electronic components such as semiconductors, LCDs, and PDPs, as well as inspection and analysis equipment. Although we operate as a trading company, we leverage our many years of experience in resist coating as a "trading company that can speak about technology" to offer optimal solutions to various customers, and we will continue to contribute to the Japanese electronic component industry.
