Yashima's electron beam deposition equipment is all custom-ordered. It is efficient, highly expandable for the future, and simple. Therefore, the price is also reasonable.
Electron beam deposition equipment is standard for vacuum deposition of high melting point materials. Our company supports not only our original deposition sources but also those from various manufacturers. We provide a high vacuum and ultra-high vacuum environment to stabilize the electron beam. We accommodate substrate heaters, rotation, and more. We support load lock specifications. We also accommodate manual/automatic operation via sequencer and touch panel.
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basic information
Basic specifications of the photo: 4-axis electron beam evaporation system Power supply: 3KW Exhaust system: Turbo molecular pump + rotary pump
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Applications/Examples of results
Vacuum deposition of various metals and some ceramics containing high melting point materials.
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Company information
The necessity of thin film production in next-generation technologies is increasing more and more. In thin film production, there is a demand for technology that is low-temperature, dense, and also highly productive. Our company has made it possible to implement arc discharge measures that were not achievable with conventional opposing target sputtering methods, and we manufacture and sell uniform plasma sputtering devices that meet the above conditions.