It has a fully automatic startup function for ICP-MS.
The "NAC-316" is a fully automated trace metal contaminant recovery device with bulk etching capabilities for Si wafers. Even beginners can obtain analytical results with ICP-MS. Additionally, it has two load ports, significantly improving work efficiency, and inline connection (OHT) is also possible. 【Features】 ■ Capable of recovering both hydrophilic wafers and hydrophobic wafers ■ Automatically performs bulk etching, recovery, and analysis on wafers set in the load port ■ Bulk etching is possible in two sizes: 200mm and 300mm ■ Bulk etching can also be performed in multiple layers on a single wafer, etc. *For more details, please download the PDF or contact us.
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【Other Features】 ■ The necessary reagents for cleaning solution, recovery solution, and calibration curve can be automatically exchanged by removing the cap from a 500mL or 100mL bottle and placing it on the reagent platform. ■ Automatically mixes and produces cleaning solution, recovery solution, and dilution solution using the provided reagents. ■ VPD & recovery are compatible with 200mm and 300mm wafers, etc. *For more details, please download the PDF or contact us.
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Our company has responded to various needs by utilizing surface contamination recovery devices. With technology that has made it possible to recover contamination from hydrophilic surfaces, which was previously thought to be impossible, we will help solve your concerns. Please feel free to contact us if you have any requests.