It is a recovery device for hydrophobic wafers that can be easily used anywhere.
The SC-3000 is a simple device for recovering trace contaminants from hydrophobic wafer surfaces. It connects to a computer to create various recovery patterns and collects (samples) trace metal contamination from the surface and sides (bevel area) of silicon wafers. Additionally, it requires minimal external resources and occupies little space, making it easy to introduce the device. Please feel free to contact us if you have any inquiries. 【Features】 ■ Compatible with wafer sizes from 100mm to 300mm ■ Capable of recovering from the bevel area of hydrophobic wafers ■ Recovery possible from the center, donut area, outer perimeter, and entire surface set at radii r1 and r2 ■ Automatic supply of recovery liquid and suction of recovery liquid after sampling ■ Contaminated chips are automatically cleaned after suctioning the recovery liquid, etc. *For more details, please download the PDF or contact us.
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【Specifications (Excerpt)】 ■ Cleanliness of the device: 10 elements including Na, Mg, Al, K, Ca, Cr, Fe, Ni, Cu, Zn at 1×10^8 atoms/cm² or less ■ Utilities: DIW, CDA, AC-100V, cleaning solution for chip cleaning (bottle) ■ Operating environment: Inside a clean draft ■ External dimensions: 494W × 494D × 540H (mm) ■ Weight: Approximately 40Kg *For more details, please download the PDF or contact us.
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Our company has responded to various needs by utilizing surface contamination recovery devices. With technology that has made it possible to recover contamination from hydrophilic surfaces, which was previously thought to be impossible, we will help solve your concerns. Please feel free to contact us if you have any requests.
