Plasma PIC Monte Carlo Collision Module (PIC-MCCM)

High calculation accuracy! A module that excels in plasma analysis when the plasma density inside the device is relatively low.

The "Plasma PIC Monte Carlo Collision Module (PIC-MCCM)" is a module that can analyze the behavior of non-equilibrium low-temperature plasma within devices such as plasma CVD systems, plasma etching systems, sputtering systems, and manufacturing equipment for functional thin films. It specializes in plasma analysis when the plasma density within the device is relatively low (below approximately 10^16 [#/m3]; about 10^10 [#/cc]), and it is also capable of analyzing the behavior of charged particles, such as trajectory analysis of electron beams and ion beams in electromagnetic fields. 【Features】 ■ The physical model is relatively simple. ■ There are few assumptions and approximations in the physical model brought into the simulation. ■ The calculation accuracy is high. ■ Coupling with SMCM allows for coupled simulations that take into account the effects of buffer gas and radical species. *For more details, please refer to the PDF materials or feel free to contact us.

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