It is possible to perform calculations related to ion implantation or the sputtering phenomenon itself!
The "Dynamic Monte Carlo Simulation Software (SASAMAL)" is a simulation code based on the Monte Carlo method using two-body collision approximation. It calculates the sputtering rate when high-energy ions are incident on an amorphous target, the angular distribution and energy distribution of sputtered atoms, the percentage of backscattering of incident particles, their angular distribution and energy distribution, and the penetration depth of ions into the target (Depth Profile). It can be used to evaluate the ion energy dependence and incident angle dependence of sputtering rates for various materials, as well as to assess the surface modification processes of materials due to ion implantation. 【Features】 ■ Even when used alone, this product can perform calculations related to ion implantation or the sputtering phenomenon itself. ■ When combined with PIC-MCCM or DSMCM, it is possible to investigate the effects of a wide range of device parameters. ■ It can also evaluate the relationship between gas pressure in the device and sputtering rate. *For more details, please refer to the PDF materials or feel free to contact us.
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【Function List (Partial)】 ■Application Areas: Surface behavior due to ion implantation, ion beam mixing, DLC film formation behavior, analysis of sputtering phenomena ■Modeling Method: Particle method ■Analysis Method: Dynamic Monte Carlo method based on two-body collision approximation ■Target Dimension: One-dimensional ■Solver: Driver SASAMAL / Module SASAMAL ■GUI Features: Uses the attached GUIM (PNG file output, print output, text data input/output, arbitrary zooming of display screen) ■Pre/Post: Uses the attached GUIM ■Additional Features - Built-in database of surface binding energies - Built-in database of ejection energies - Rebound cascade tracking - Background calculations ■Analysis Scale: Unlimited (limited by memory capacity and computation time in practice) *For more details, please refer to the PDF document or feel free to contact us.
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【Purpose】 ■Evaluation of the dependence of sputtering rates of various materials on ion incident energy and incident angle, as well as the evaluation of surface modification processes of materials due to ion implantation. *For more details, please refer to the PDF document or feel free to contact us.
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We are an independent company that aims to develop and sell software for analyzing physical phenomena in the fields of vacuum, plasma, rarefied gases, and gas electronics. We consider creativity, development capability, technical expertise, and competitiveness as our corporate spirit.
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