A pure water heating device suitable for hot deionized water cleaning of silicon substrates and hot deionized water lift drying!
The "HDW III" is a device used for the cleaning of ultra-pure water in semiconductor manufacturing processes, solar cell manufacturing processes, and glass substrates in liquid crystal manufacturing processes. It non-contactly heats the water using a carbon heater within a quartz glass container. It features stable temperature control within ±1° through PID control and can achieve a temperature rise from startup to operating temperature in under 120 seconds. Additionally, it accommodates a wide range of flow rates and temperatures, allowing for temperature adjustments in response to flow rate changes. 【Features】 ■ Clean heating ■ High efficiency and energy-saving ■ High-performance temperature adjustment ■ A comprehensive lineup tailored to the usage flow rate *For more details, please download the PDF or contact us.
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basic information
【Lineup】 ■HDW III-12 ■HDW III-18 ■HDW III-24 ■HDW III-36 *For more details, please download the PDF or contact us.
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Applications/Examples of results
【Applications】 ■ Warm pure water cleaning of silicon substrates ■ Warm pure water cleaning of glass substrates for LCDs ■ Warm pure water cleaning of photomasks ■ Warm pure water cleaning as a substitute for fluorocarbon-based cleaning ■ Used for warm pure water pull-up drying *For more details, please download the PDF or contact us.
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Company information
Our company is composed of three business divisions, manufacturing hard disk burnishing machines with approximately 100% global market share, test handlers for semiconductors, appearance inspection equipment, automation equipment for various industries, top-class share high-efficiency solar cell wafer texturing equipment, various precision cleaning devices, drying equipment, and more. Please feel free to contact us if you have any inquiries.
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