Atomic Force Microscope (AFM) "Park NX-3DM"

Fully automated industrial AFM with NX technology implemented.

The "Park NX-3DM" is a fully automated AFM (Atomic Force Microscope) system designed for overhang profiling, high-resolution sidewall imaging, and critical angle measurement. With its patented separated XY and Z scanning system equipped with an inclined Z scanner, it overcomes the challenges of conventional and flare chip methods in accurate sidewall analysis. 【Essential Tool for Wafer Fabrication】 ■ Fully automated industrial AFM using advanced and precise Park NX technology ■ Tilt head design for undercut and overhang structures ■ Accurate sidewall roughness measurement without the need for sample pretreatment ■ High-quality images can be obtained without damaging the device or sample due to the fully non-contact mode (TM) *For more details, please download the PDF or feel free to contact us.

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