Fully automated industrial AFM with NX technology implemented.
The "Park NX-3DM" is a fully automated AFM (Atomic Force Microscope) system designed for overhang profiling, high-resolution sidewall imaging, and critical angle measurement. With its patented separated XY and Z scanning system equipped with an inclined Z scanner, it overcomes the challenges of conventional and flare chip methods in accurate sidewall analysis. 【Essential Tool for Wafer Fabrication】 ■ Fully automated industrial AFM using advanced and precise Park NX technology ■ Tilt head design for undercut and overhang structures ■ Accurate sidewall roughness measurement without the need for sample pretreatment ■ High-quality images can be obtained without damaging the device or sample due to the fully non-contact mode (TM) *For more details, please download the PDF or feel free to contact us.
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【System Specifications】 ■ Electric XY Stage ・200mm: Drive 275mm x 200mm, Resolution 0.5μm ・300mm: Drive 375mm x 300mm, Resolution 0.5μm ■ Electric Z Stage ・Z Drive Distance: 30mm ・Resolution: 0.08μm, Repeatability < 1μm ■ Electric Focus Stage ・Z Drive Distance: 11mm, Direct Optical System *For more details, please download the PDF or feel free to contact us.
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Our company is a specialized manufacturer of nano-measurement instruments that develops, produces, and sells highly accurate and user-friendly Atomic Force Microscopes (AFM) using innovative technology and automation software. We have established a global sales network in over 30 countries, and our Atomic Force Microscopes are used in various fields around the world. As a rapidly growing AFM company with world-class technological capabilities, we are committed to developing core technologies and excellent product development, leading the advancement of nanotechnology.