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  5. Other semiconductor manufacturing equipment
  6. Process Gas Monitor "M-080QA-HPM"

Process Gas Monitor "M-080QA-HPM"

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last updated:Jan 24, 2023

キヤノンアネルバ 栗木本社
キヤノンアネルバ 栗木本社
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Achieves a wide range (1 to 80 amu) and high-sensitivity partial pressure measurement from the reached pressure of the vacuum chamber to the sputtering process pressure.

The process gas monitor "M-080QA-HPM" is a quadrupole mass spectrometer capable of measuring in the mass range of 1 to 80 amu, and it can measure from pressures below 2.0 Pa (no differential pumping system required). It monitors the partial pressure of gases during the process, detects abnormalities such as process gas anomalies and leaks, and provides process stability. It can be utilized for quality control and residual gas analysis during the process. 【Features】 ■ High sensitivity detection of hydrogen during the process ■ High sensitivity measurement across a wide pressure range ■ Long maintenance cycle and low running costs ■ Various alarm functions to detect abnormalities during production *For more details, please refer to the PDF document or feel free to contact us. The document states the operating pressure as "below 1.3 Pa," but the correct value is "below 2.0 Pa."

    Other semiconductor manufacturing equipment
イプロスプロセスガスモニタバナー(550×550).jpg

Process Gas Monitor "M-080QA-HPM"

イプロスプロセスガスモニタバナー(550×550).jpg
イプロスプロセスガスモニタバナー(550×550).jpg アネルバ1.png
  • Related Link - https://anelva.canon/business/component/ma_detail0…
  • Special site - Product/service details - https://pr.mono.ipros.com/canon-anelva/product/

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【Specifications (Excerpt)】 ■Measurement mass range: m/z 1 to 80 ■Operating pressure: 2.0 Pa or less ■Minimum detection concentration: 5 ppm (excluding H2) H2: 100 ppm ■SEM sensitivity: 7.5 × 10^-5 A/Pa or more ■Faraday sensitivity: 7.5 × 10^-9 A/Pa or more ■Connection flange: φ 70 ICF ■Weight: Analysis tube 1.1 kg, Controller 2.2 kg ■Communication standard: RS-232C or RS-485 ■Control software: QUADVISION3 compatible with Win7, 8.1, 10 *For more details, please refer to the PDF document or feel free to contact us.

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Applications/Examples of results

【Usage】 ■Quality control during film formation ■Residual gas analysis ■Leak check *For more details, please refer to the PDF document or feel free to contact us.

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Quadrupole mass spectrometer (process gas monitor) 'M-080QA-HPM'

Quadrupole mass spectrometer (process gas monitor) 'M-080QA-HPM'

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キヤノンアネルバ

キヤノンアネルバ 栗木本社

Machine elements and parts

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Canon Anelva has been honing its skills in the ultra-high vacuum field, which requires advanced technological capabilities, since its establishment in 1967 as a developer and manufacturer of vacuum thin film formation equipment and vacuum components. As a company expanding its business globally, we aim to contribute to the development of international society under the corporate philosophy of "coexistence" advocated by the Canon Group. Moving forward, we will continue to strive to create high value-added products based on solid technological capabilities and play a role in the advancement of electronics.

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