It is possible to select an optimal acceleration based on the viscosity of the resist coating agent! We also pay attention to maintainability.
This is an introduction to our small resist coater. Resist coating material is applied to glass substrates using a spinner. We pay attention to airflow control within the chamber and maintenance, allowing for optimal acceleration selection based on the viscosity of the resist coating material. *For more details, please refer to the PDF document or feel free to contact us. Wafer, batch-type cleaning equipment, coating and developing equipment, spin cleaning equipment, spin coater, semiconductor manufacturing equipment, resist coating equipment, coating equipment, coating uniformity, low price, photolithography process, batch substrate cleaning machine, batch spin cleaning machine, surface treatment, wafer cleaning equipment.
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* Under a team of experts well-versed in the manufacturing processes of various devices, we engage in consistent in-house activities that include the custom development, manufacturing, and sales of distinctive wet processing equipment tailored to meet the diverse needs of our clients, backed by years of accumulated know-how since our establishment, as well as after-sales support. * We manufacture and sell optimal system equipment while proposing processes that align with our clients' needs. * Our company is well-acquainted with various equipment forms such as batch (wet stations) and sheet (conveyor, spin), and we have numerous achievements; however, we particularly stand out with our Spin sheet-type equipment. * With the establishment of "patents" and "trademarks," we ensure that our products, such as the "Spin Dip Processor" and "UDS Processor," which possess a wide variety of unique features, cannot be easily replicated by others, attracting worldwide attention.