Consistent processing of photolithography is possible.
■Supports ultra-large heavy substrates of the G8.5 generation. ◎Supported substrate size: 1.3m X 1.5m X 15mm t ■Compatible with the integrated processing of the photolithography process. ◎Processing steps: LD ⇒ Development ⇒ Etching ⇒ Stripping ⇒ Cleaning ⇒ ULD ■We have multiple units in operation from various domestic manufacturers. *For more details, please refer to the PDF document or feel free to contact us. Sheet-type cleaning equipment, substrate cleaning equipment, spin cleaning equipment, semiconductor manufacturing equipment, semiconductors, cleaning equipment, resist, photoresist, photolithography process, organic EL, surface treatment, wafer stripping equipment, wafer cleaning equipment, wafer cleaning machines.
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* Under a team of experts well-versed in the manufacturing processes of various devices, we engage in consistent in-house activities that include the custom development, manufacturing, and sales of distinctive wet processing equipment tailored to meet the diverse needs of our clients, backed by years of accumulated know-how since our establishment, as well as after-sales support. * We manufacture and sell optimal system equipment while proposing processes that align with our clients' needs. * Our company is well-acquainted with various equipment forms such as batch (wet stations) and sheet (conveyor, spin), and we have numerous achievements; however, we particularly stand out with our Spin sheet-type equipment. * With the establishment of "patents" and "trademarks," we ensure that our products, such as the "Spin Dip Processor" and "UDS Processor," which possess a wide variety of unique features, cannot be easily replicated by others, attracting worldwide attention.
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