Achieving excellent film thickness distribution and reproducibility! Equipped with a substrate plasma cleaning system.
The "Carbon Nanotube Synthesis Device" achieves excellent substrate temperature distribution and gas flow methods. It enables fully automated CNT synthesis. It is equipped with a substrate plasma cleaning system. We can also manufacture multi-chamber specifications and various custom orders, so please feel free to contact us when needed. 【Features】 ■ Fully automated CNT synthesis ■ Equipped with a substrate plasma cleaning system ■ Achieves excellent substrate temperature distribution and gas flow methods ■ Achieves excellent film thickness distribution and reproducibility ■ Abundant accumulated data *For more details, please refer to the PDF document or feel free to contact us.
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basic information
【Specifications】 ■Substrate size: Maximum φ12 inches ■CNT synthesis gas: CH series, H2 ■Substrate heating temperature: Up to 800℃ (substrate surface) ■Vacuum exhaust: RP ■Pressure control: APC control ■Control operation ・Control: PLC ・Operation: Touch panel or PC ■Data logging: External memory or PC ■Options ・Automatic substrate transfer system ・Gas detector ・Cylinder cabinet, etc. *For more details, please refer to the PDF document or feel free to contact us.
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Applications/Examples of results
【Applications】 ■ Energy-related ■ Material-related ■ Bio-related ■ Nanotechnology-related ■ Electronics-related *For more details, please refer to the PDF document or feel free to contact us.
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Company information
Japan Create has been challenging cutting-edge technologies to respond to the diversification of the semiconductor industry with high precision, labor-saving, and miniaturization. We seek infinite possibilities in high technology and create reliable know-how that matches user needs with our uniqueness. We will continue to strive towards high-level technology.