Carbon nanotube synthesis device

Achieving excellent film thickness distribution and reproducibility! Equipped with a substrate plasma cleaning system.

The "Carbon Nanotube Synthesis Device" achieves excellent substrate temperature distribution and gas flow methods. It enables fully automated CNT synthesis. It is equipped with a substrate plasma cleaning system. We can also manufacture multi-chamber specifications and various custom orders, so please feel free to contact us when needed. 【Features】 ■ Fully automated CNT synthesis ■ Equipped with a substrate plasma cleaning system ■ Achieves excellent substrate temperature distribution and gas flow methods ■ Achieves excellent film thickness distribution and reproducibility ■ Abundant accumulated data *For more details, please refer to the PDF document or feel free to contact us.

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