UV-LED light source! Automatic exposure device for semiconductor manufacturing | Mask aligner

This is an exposure device that has replaced the light source from a mercury lamp to an LED. It features automatic parallel adjustment, complete non-contact gap management, and auto-alignment functions.

This product is an automatic batch equal magnification exposure device (mask aligner) equipped with a UV-LED light source. One of our features is that it allows for fully non-contact automatic parallel adjustment of the stage and mask for the photomask and wafer. By incorporating a super-precision UVW drive stage and performing high-performance image processing, the alignment of the photomask and wafer is also carried out accurately. It supports exposure methods including proximity, soft, and hard contact. We offer a lineup that matches production volume, from manual machines to fully automatic machines, and since we handle everything from design to manufacturing and sales in-house, we have achieved low prices. 【Features】 ■ Compatible with i-line (365nm) and H-line (405nm)! (Please consult us for g-line) ■ Non-contact parallel alignment and exposure of photomask and wafer ■ Auto-alignment function ■ Easy setup change and compatible with multiple substrate sizes ■ Space-saving & easy maintenance ■ Achieves low cost and compact design, suitable for small-batch production of various types ■ Equipped with a super-precision UVW stage *For more details, please refer to the PDF document or feel free to contact us.

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