Achieving low dielectric constant! PPS sintered porous material boasts excellent chemical resistance and high radiation resistance. *Samples and prototypes are currently being accepted.
We would like to introduce our jointly developed product with Polyplastics Corporation, the "PPS Sintered Porous Body." Through the use of PPS resin (development product) by the company and the sintering technology accumulated by Tomei Industries over many years, we have successfully achieved the porous formation of PPS, which was previously difficult. As this is a new development, we are exploring applications. Please feel free to contact us for samples or prototypes. 【Features】 ■ Heat resistance temperature of 100°C (melting point 290°C) ■ Excellent chemical resistance ■ Achieves low dielectric constant ■ High resistance to radiation ■ Porosity of 50% ■ Rare technology in Japan *For more details, please refer to the PDF document or feel free to contact us.
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basic information
【Specifications】 ■Pore diameter: 20μ/60μ ■Pore rate: 50% ■Heat resistance temperature: 100℃ ・Melting point: 290℃ ・Load deflection temperature (1.86Mpa): 100℃ ■Characteristics: High toughness, low dielectric constant, chemical resistance, radiation resistance *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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Company information
Bumei Industrial Co., Ltd. has been manufacturing a wide range of porous products made from plastic resins since its establishment, accumulating reliable technology and deep trust. By focusing on plastic resins, which are more cost-effective than metals, we respond to the diverse needs of the times and strive to create products that can be utilized in a wide range of fields. Moving forward, we will continue to enhance our high quality, low cost, process management, and safety management, actively challenging ourselves to provide products that meet our customers' demands, contribute to society, and unite our employees in unwavering efforts. We sincerely ask for your continued support.
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