[High corrosion-resistant Y2O3/YOF film case] As a protective film for etching equipment parts.
Far superior in corrosion resistance and plasma resistance compared to protective films created by thermal spraying or aerosol deposition! Yttrium oxide produced by a unique ion-assisted deposition method.
This is an introduction to the use of high corrosion-resistant Y2O3 film (yttrium oxide film) and YOF film (yttrium fluoride film) with high plasma resistance as protective films for internal materials of etching equipment, utilizing ion-assisted deposition methods. The miniaturization of semiconductors is progressing rapidly. The competition in semiconductor manufacturing hinges significantly on yield and equipment operating time. Protective films for etching equipment components have traditionally used yttrium oxide films created by thermal spraying or aerosol deposition. However, since etching equipment etches silicon wafers while simultaneously etching the equipment itself, the particles generated have become a problem for manufacturing yield, making these methods unsuitable for advanced processes. Yttrium oxide films produced by ion-assisted deposition are much denser compared to those created by thermal spraying or aerosol deposition, offering significant advantages at the particle level. Additionally, this dense film can be deposited in thicker layers compared to sputtering, which can greatly improve equipment operating time.
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basic information
Based on our achievements using cutting-edge miniaturization technology such as 5nm in manufacturing processes in South Korea, our company was established in Japan in 2019. To support the Japanese semiconductor manufacturing industry, we will be depositing films on etching equipment components. As a first step, by regenerating films of Y2O3 (yttrium oxide) and YOF (yttrium fluoride) on dielectric windows, we can significantly reduce the costs of RF window (dielectric window/top plate) replacement (substantial cost savings compared to purchasing genuine parts!) and greatly minimize downtime associated with equipment maintenance, thereby increasing equipment operating time. In addition to film deposition on dielectric windows, viewports, and EPD, we will also gradually address film deposition on structural components such as focus rings and chamber sidewalls. If you are looking for good films with plasma resistance, please feel free to consult with us. *For more details, please refer to the PDF materials or feel free to contact us.
Price information
The cost per batch is 1 million yen. The unit cost of film formation varies depending on the number of parts that fit into a circle with a diameter of 1200 mm.
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Applications/Examples of results
For more details, please refer to the PDF document or feel free to contact us.
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Company information
Tsubasa Vacuum Research Co., Ltd. was established in 2019 as a consulting company related to protective films for semiconductor manufacturing equipment parts, leveraging years of experience in the semiconductor industry. In 2021, to materialize the know-how accumulated thus far and accelerate its implementation, we transformed into a "contract coating venture company" that also supplies corrosion-resistant protective films for manufacturing equipment used in Japan. When high melting point metal oxide films are considered as dense films, many applications beyond semiconductors emerge. By aiming for the pinnacle of niche industries, our company contributes to many industries and ultimately dedicates itself to the sustainable development of the future.