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  3. つばさ真空理研 横浜ラボラトリー
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つばさ真空理研 横浜ラボラトリー

capital1200Ten thousand
addressKanagawa/Naka-ku, Yokohama-shi/12 Nishikimachi, Mitsubishi Heavy Industries Yokohama Manufacturing Plant, Honmoku Second Factory 104, YOKOHAMA HARDTECH HUB
phone045-900-0354
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last updated:Sep 30, 2022
つばさ真空理研logo
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  • Products/Services(5)
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つばさ真空理研 Company Profile

We are a venture company that develops and provides contract film deposition of high melting point metal oxide films that are ultra-dense and thick at the atomic level using our unique vacuum deposition technology.

Tsubasa Vacuum Research Co., Ltd. was established in 2019 as a consulting company related to protective films for semiconductor manufacturing equipment parts, leveraging years of experience in the semiconductor industry. In 2021, to materialize the know-how accumulated thus far and accelerate its implementation, we transformed into a "contract coating venture company" that also supplies corrosion-resistant protective films for manufacturing equipment used in Japan. When high melting point metal oxide films are considered as dense films, many applications beyond semiconductors emerge. By aiming for the pinnacle of niche industries, our company contributes to many industries and ultimately dedicates itself to the sustainable development of the future.

Business Activities

■Development of film materials and film deposition technology utilizing ion assist vacuum deposition technology ・Yttrium oxide film ・Yttrium fluoride film ■Contract film deposition service for plasma-resistant protective films for etching equipment parts ■Contract film deposition service for regeneration of plasma-resistant protective films for etching equipment parts <Yokohama Laboratory> 〒231-0812 12 Nishikicho, Naka Ward, Yokohama City, Kanagawa Prefecture, Mitsubishi Heavy Industries Yokohama Works, Honmoku No. 2 Factory 104 (within YOKOHAMA HARDTECH HUB)

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Products/Services (5)

Strong oxygen barrier film: transparent and dense amorphous alumina film. product image
Strong oxygen barrier film: transparent and dense amorphous alumina film.
Y5O4 F7 film for the protective film of etching/ashing device components. product image
Y5O4 F7 film for the protective film of etching/ashing device components.
Aging time significantly reduced! Plasma-resistant and corrosion-resistant YOF protective film. product image
Aging time significantly reduced! Plasma-resistant and corrosion-resistant YOF protective film.
[High corrosion-resistant Y2O3/YOF film case] As a protective film for etching equipment parts. product image
[High corrosion-resistant Y2O3/YOF film case] As a protective film for etching equipment parts.

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catalog(3)

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Amorphous alumina film using ion-assisted deposition method.

Amorphous alumina film using ion-assisted deposition method.

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Product catalog for plasma-resistant and corrosion-resistant yttrium oxide films for etching device components.

Product catalog for plasma-resistant and corrosion-resistant yttrium oxide films for etching device components.

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Tsubasa Vacuum Research Institute Co., Ltd. Company Profile

Tsubasa Vacuum Research Institute Co., Ltd. Company Profile

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Company name つばさ真空理研 横浜ラボラトリー
Contact addresspostalcode 231-0815 Kanagawa/ Naka-ku, Yokohama-shi/ 12 Nishikimachi, Mitsubishi Heavy Industries Yokohama Manufacturing Plant, Honmoku Second Factory 104, YOKOHAMA HARDTECH HUBView on map TEL:045-900-0354 FAX:0466-53-8728
Industry Other manufacturing
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