The Y5O4 F7 film has a small change in surface fluorine content, allowing for a significant reduction in the aging time of the etching equipment. Its transmittance characteristics are also excellent.
In the dry etching process, which is one of the semiconductor manufacturing processes, when wafer processing is performed, phenomena occur where products from the process gas itself and by-products during etching adhere to the chamber inner walls and the surfaces of parts inside the chamber. The adhesion of these deposits changes the surface state of the chamber before and after processing, leading to fluctuations in the process conditions. To mitigate such fluctuations in process conditions, conventional techniques have applied a method (aging) to stabilize the chamber inner surface state by processing similar wafers before product processing to coat the deposits. The Y5O4 F7 film has a smaller change in surface fluorine content before and after plasma treatment compared to the Y2O3 film, which significantly shortens the aging time of the etching equipment and contributes to increased equipment operating time.
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basic information
The Y5O4F7 film produced by the ion-assisted deposition method is formed by independently controlling the deposition rate of Y2O3 and YF3 through binary simultaneous deposition. Therefore, the composition can be freely controlled, allowing for the selection of the crystal structure. By varying the amount of fluorine, an optimal Y5O4F7 film is formed.
Price information
The unit price is calculated by dividing the amount of 1.5 to 2 million yen per batch by the number of base materials that fit inside a diameter of 1200 mm.
Price range
P5
Delivery Time
※The delivery date may vary depending on the jigs, so please feel free to contact us.
Applications/Examples of results
Protective film for Hatcher and Asher components (RF window, End Point Detector, chamber side, Shower Plate, ESC, etc.)
Company information
Tsubasa Vacuum Research Co., Ltd. was established in 2019 as a consulting company related to protective films for semiconductor manufacturing equipment parts, leveraging years of experience in the semiconductor industry. In 2021, to materialize the know-how accumulated thus far and accelerate its implementation, we transformed into a "contract coating venture company" that also supplies corrosion-resistant protective films for manufacturing equipment used in Japan. When high melting point metal oxide films are considered as dense films, many applications beyond semiconductors emerge. By aiming for the pinnacle of niche industries, our company contributes to many industries and ultimately dedicates itself to the sustainable development of the future.
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