Transparent from visible light to the ultraviolet region, the amorphous alumina film produced by ion-assisted deposition is very dense and can be used as a barrier film.
The amorphous alumina film created by ion assist deposition is an ultra-dense oxygen barrier film with a uniform fine structure where the crystal particles are below 50 nm. It is transparent from the visible light to ultraviolet regions, making it suitable for various applications.
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basic information
When a 2μm thick amorphous alumina film is deposited on quartz glass using ion-assisted deposition, the transmittance in the visible to ultraviolet region reaches 90%, and a film quality with a uniform fine structure of less than 50nm is obtained. It is expected to serve as a strong oxygen barrier film.
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Applications/Examples of results
It can be used as a strong oxygen barrier film and as a decorative protective film.
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Tsubasa Vacuum Research Co., Ltd. was established in 2019 as a consulting company related to protective films for semiconductor manufacturing equipment parts, leveraging years of experience in the semiconductor industry. In 2021, to materialize the know-how accumulated thus far and accelerate its implementation, we transformed into a "contract coating venture company" that also supplies corrosion-resistant protective films for manufacturing equipment used in Japan. When high melting point metal oxide films are considered as dense films, many applications beyond semiconductors emerge. By aiming for the pinnacle of niche industries, our company contributes to many industries and ultimately dedicates itself to the sustainable development of the future.