Aging time significantly reduced! Plasma-resistant and corrosion-resistant YOF protective film.
The era has shifted from Y2O3 to YOF! Significantly reduced aging time for etching equipment, decreased particles, greatly increased equipment operating time, and improved productivity!
The YOF film (yttrium fluoride film) produced by the ion-assisted deposition method not only reduces particles and significantly increases equipment operating time as a protective film for dry etching equipment parts, but it can also greatly shorten the aging time that was previously required. In today's world, where semiconductor shortages are a problem, improving yield and increasing equipment operating time are paramount for semiconductor manufacturers. The protective film created by the ion-assisted deposition method, introduced in cutting-edge manufacturing lines, can be used as a protective film for dry etching equipment parts and for regeneration during regular maintenance.
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basic information
It has been confirmed that substrates for film formation can be made from quartz, alumina, and metallic aluminum. Tsubasa Vacuum Riken Co., Ltd. has gained the trust of customers from semiconductor manufacturing equipment manufacturers and semiconductor companies as a contract film formation service provider that can create protective films, such as Y2O3 and Y5O4F7, which significantly enhance the reliability of dry etching equipment components using ion-assisted deposition methods.
Price information
The cost is 1 million yen per batch. The unit price varies depending on the number of parts that fit into a diameter of 1200 mm.
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Applications/Examples of results
- Film formation on the dielectric window of the etching device - Film formation on the viewport and endpoint detector - Film formation on the sides of the etching device chamber - Film formation on the focus ring
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Company information
Tsubasa Vacuum Research Co., Ltd. was established in 2019 as a consulting company related to protective films for semiconductor manufacturing equipment parts, leveraging years of experience in the semiconductor industry. In 2021, to materialize the know-how accumulated thus far and accelerate its implementation, we transformed into a "contract coating venture company" that also supplies corrosion-resistant protective films for manufacturing equipment used in Japan. When high melting point metal oxide films are considered as dense films, many applications beyond semiconductors emerge. By aiming for the pinnacle of niche industries, our company contributes to many industries and ultimately dedicates itself to the sustainable development of the future.
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