Tohoku Univ. Technology：Optical nanoimprinting method that enables a uniform residual layer without burr generation at mold edge: T19-159
Precise manufacture of complicated structure with sparse/dense micro/nano-patterns!
Ultraviolet nanoimprint lithography (UV-NIL) have attracted attention as an industrially acceptable nanofabrication technology from views of cost and throughput; However, the use of spincoated films of photo-curable resin on substrates causes the problems of burr generation arising from mold edges and unleveled residual layers arising from site-selective differences in pattern densities of mold surfaces. The problems make subsequent lithography processes impossible. This optical nanoimprinting method consists of micro-scale laser-drilled screen printing and nano-scale molding. High-viscosity photo-curable resins with 1-300 Pa･s can be placed by screen printing using a polyimide sheet having through poles which are fabricated by laser drilling using a picosecond pulsed laser. The minimum volume of a printed droplet is 5 fL (10-15L). The resist patterns and resultant silicon patterns with 45-nm-linewidths are fabricated.
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The revenue generated from technology transfer is reinvested as new research funding for universities and researchers, and is utilized to create further research outcomes. To ensure the smooth operation of this cycle, known as the "Intellectual Creation Cycle," we will vigorously promote technology transfer. The types of seeds we handle include patents, know-how, databases, and programs. We have established a collaborative framework by signing basic technology transfer agreements with the following universities (as of June 1, 2025): Tohoku University, Hirosaki University, Iwate University, Akita University, Fukushima University, Yamagata University, Tohoku Gakuin University, Iwate Medical University, Fukushima Medical University, Aizu University, Miyagi University, Hokkaido University, Muroran Institute of Technology, and Showa Medical University.
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