[Surface Treatment] Dust Prevention Application Related to Semiconductor Manufacturing Equipment
It is possible to suppress dust generation from the shield during vacuum deposition for parts used in vacuum chambers related to semiconductor manufacturing equipment.
■Spraying material: Aluminum ■Spraying method: Arc spraying ■Construction effect: Prevention of dust generation from the shield during vacuum deposition
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basic information
■Spraying material: Aluminum ■Spraying method: Arc spraying ■Construction effect: Prevention of dust generation from the shield during vacuum deposition
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Semiconductor manufacturing equipment related *For more details, please feel free to contact us.
Company information
Since our founding, we have expanded our business across a wide range of industries, including steel, petrochemicals, electronic components, and automotive industries. We are committed to deepening our core technologies, such as welding and various thermal spraying coating methods, and providing the best technologies and excellent products in the fields of material industries, urban environmental conservation, and energy-related industries, contributing to the prosperity of society. Furthermore, we possess unique technologies in the design, manufacturing, and installation of various plants (boilers, first and second class pressure vessels, high-pressure piping, and other fabricated products) as well as surface modification technologies such as various thermal spraying and build-up welding, providing excellent products in various fields. [In 2021, we were certified as a "One and Only" company in Kitakyushu.] ■ Construction industry license: piping, machinery installation, steel structures, painting
