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  6. Large-area film formation processing! Glass... film... ceramics... metal materials...

Large-area film formation processing! Glass... film... ceramics... metal materials...

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last updated:Feb 21, 2023

東邦化研
東邦化研
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Large-area film processing is possible! Of course, small items can also be equipped (in large quantities)!

Toho Kaken Co., Ltd. offers contract processing (coating services) for functional thin films using ion plating, vacuum deposition, sputtering, and plasma CVD. We accommodate various types of films, including metal films, reactive films such as oxide, carbide, and nitride films, alloy films, and their laminated films. We have established a system to respond to a wide range of requests, from small-scale projects for prototypes, development, and research to medium-sized production runs. With a rich lineup of equipment ranging from small to large systems and over 35 years of proven experience, we flexibly meet our customers' needs! Our large equipment can deposit films over a maximum flat area of 800mm x 1000mm. Additionally, due to the inline configuration of our equipment, we can deposit a considerable quantity in a single day. Just because we have large equipment doesn't mean we can only handle large substrates. It is also possible to load many small substrates for film deposition, which offers advantages in mass production costs! Please feel free to consult with us! ★

    plasticGlassCeramics
大面積.jpg

Large-area film formation processing! Glass... film... ceramics... metal materials...

大面積.jpg
大面積.jpg
  • Related Link - http://www.tohokaken.jp/index.htm

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■Supported Film Types Metal Films: Al, Au, Ag, Cu, Ni, Cr, Mg, B, Ti, Zr, Nb, Mo, Pd, In, Si, Ta, W, Sn, Pt, etc. Stacked Films: Au/Ni/Cr, Au/Pt/Ti, Au/Pd/Ti, Au/Cr, Cu/Cr, etc. Oxide Films: Al2O3, SiO2, TiO2, Cr2O3, ITO, MgO, NbO, Ta2O5, WO3, ZrO2, ZnO, etc. Nitride Films: AlN, BN, CrN, MoN, NbN, SiN, TaN, TiN, etc. Carbide Films: SiC, TiC, BC, etc. *Please consult us as it may vary depending on the equipment used. ■Maximum Usable Size: 800×1000mm *We have a wide range of equipment from small to large. ■Supported Substrates - Si Wafer - Glass - Film - Ceramics - Metal Materials - Others

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Very easy to understand 'Thin Film Q&A'

Very easy to understand 'Thin Film Q&A'

TECHNICAL
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Technical Documentation on Surface Treatment Thin Film Coating

Technical Documentation on Surface Treatment Thin Film Coating

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Toho Kaken Co., Ltd. Catalog with Processing Results

Toho Kaken Co., Ltd. Catalog with Processing Results

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Ion plating method

Ion plating method

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Sputtering method

Sputtering method

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Plasma CVD method

Plasma CVD method

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Company information

東邦化研

東邦化研

Electronic Components and Semiconductors

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Our company offers contract processing (coating services) for functional thin films using ion plating, vacuum deposition, sputtering, and plasma CVD. Since our inception, we have focused on "functional thin films" such as conductivity, insulation, and corrosion resistance. We accommodate various types of films, including metal films, reactive films like oxide, carbide, and nitride films, as well as their laminated films. We have established a system to respond to a wide range of requests, from small-scale prototypes, development, and research to medium-sized production runs. Currently, we have 11 deposition devices in operation, ranging from small machines with a diameter of 300mm to inline mass production machines with a film formation area of 1000mm x 900mm. All processes, from the unboxing of substrates entrusted by customers to the packaging of the coated products, are conducted within a clean room. If you are considering functional thin films, please feel free to contact us! Based on our flexible response and over 35 years of experience, we will meet your needs! *Information about our exhibition participation is also available on our website. Please take a look.

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