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  6. Thin Film Patterning Process

Thin Film Patterning Process

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last updated:Nov 21, 2022

ジオマテック
ジオマテック
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A processing technology called "thin film patterning" that enables the creation of a wide variety of membrane structures and etching patterns.

■Overview We perform pattern formation processing of various metal films and ITO films on various film substrates (such as polyimide, PET, PEN), glass, and Si substrates. By combining the thin film formation technology and etching technology that we have accumulated so far, we can create a diverse range of film structures and etching patterns that were previously unimaginable. By accurately adjusting the film formation conditions and pattern conditions, we have achieved film formation and patterning on film substrates as thin as 7.5μm. We also carry out coating, as well as processing for patterning only and lift-off processing.

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Thin Film Patterning Process

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  • Related Link - https://www.geomatec.co.jp/products-and-solutions/…

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■Features and Strengths - Capable of creating a wide variety of membrane structures and etching patterns - Integrated production from film formation to patterning - Proven track record of film formation and patterning on substrates as thin as 7.5μm - Processing for patterning only is also possible

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Self-testing kit A self-testing kit useful for home medical care and healthcare.

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ジオマテック

ジオマテック

Industrial Electrical Equipment

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We are a specialized manufacturer of thin film processing technology. ----- Expanding Business Areas. ----- New products are continuously being introduced to society. Customer needs for vacuum deposition technology are becoming more advanced and diverse every day. At Geomatec, we strive to improve our technology while holding discussions with our customers, and we aim to respond to their various requests as much as possible.

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