Flattening various materials at the atomic scale through pads with catalytic functions.
A unique etching technology that utilizes catalytic action to chemically remove only the protrusions on the processed surface by moving ultra-pure water as the processing fluid over a substrate with pads that have catalytic functions (such as films of Pt or Ni). It flattens the surfaces of various materials, including glass and SiC, at the atomic scale. CARE further achieves a P-V of 0.7 nm and aims to become the ultimate processing method capable of achieving flatness at the level of a single atom in the future.
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basic information
Ideal for semiconductor materials that require atomic-level smooth surface polishing methods.
Price range
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Applications/Examples of results
Applicable materials: Mirror substrates (quartz glass, Si, etc.) Various oxides, nitrides, and carbides Various optical glasses and diffraction grating substrates
Company information
Our company is always exploring the latest technologies and is committed to a consistent approach from planning to development, design, and manufacturing of various systems with advanced development capabilities. Currently, we are expanding our unique products and contract development across a wide range of industries, including medical and biotechnology, chemicals, semiconductors, metal processing, printing, and textiles. We will continue to do our utmost to sincerely meet our customers' needs. We sincerely appreciate your continued support.
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