A team of engineers actively challenging new fields and responding to the needs of the next generation!
Our company focuses on the xylene derivatives business and conducts research and development based on the chlorination of toluene and precise distillation technology cultivated since our founding. We develop high-quality new products using cost-effective methods to meet our customers' needs. Please feel free to contact us with any inquiries. 【Our Strengths】 ■ We excel in selectively chlorinating aromatic compounds due to our years of experience. ■ We possess photochemical chlorination equipment, allowing us to produce the chlorinated products requested by our customers. ■ We have various hydrolysis conditions available. ■ We can industrially convert functional groups using hydrochloric acid generated from chlorination and hydrolysis. ■ We have hydrochloric acid treatment facilities and can handle reactions that generate hydrochloric acid. ■ We can also respond to customer requests for various functional group conversions using chlorinated compounds, among other capabilities. *For more details, please feel free to contact us.
Inquire About This Product
basic information
For more details, please feel free to contact us.
Price range
Delivery Time
Applications/Examples of results
For more details, please feel free to contact us.
catalog（2）
Download All Catalogs
Company information
Our company provides various chlorinated compounds in high purity through the technologies of "chlorination" and "distillation/crystallization." In the chemical industry that produces various materials, we strive for efficient production while maximizing the use of limited resources and continuing our endless challenges aimed at coexisting with the global environment. Please feel free to contact us if you have any inquiries.
![Case studies of product design and analysis using 3DEXPERIENCE [Video Distribution]](https://image.mono.ipros.com/public/product/image/15a/2001510653/IPROS7122501373359565176.jpg?w=280&h=280)
![[Case Study] Eliminating concerns about part interference with overall machine interference checks!](https://image.mono.ipros.com/public/product/image/2cc/2001406557/IPROS09598775543481153627.jpeg?w=280&h=280)