Optical Endpoint Monitor [Manufactured by Verity]

Ultra-high-performance endpoint detection system for optical endpoint detection that addresses the ion milling process, which was difficult to detect.

You can monitor the light emission from the etching process in real-time. Equipped with a CCD sensor, it supports a wavelength range of 200-800 nm, has high sensitivity in the UV range, and is equipped with a spectrometer that can capture even subtle changes that were difficult to detect. Additionally, it supports the ion milling process with a vacuum feed-through option. The optical endpoint monitor from Verity is designed to install a measurement receiving part via a flexible tube near the sample in a vacuum. By measuring the material emission during the etching/milling process, it obtains temporal changes in film thickness and film type. 【Features】 ◼ Powerful endpoint determination capability ◼ Uses dedicated high-function SpectraViewTM software ◼ Capable of endpoint detection, fault detection, and process diagnostics ◼ Wavelength range of 200 – 800 or 900 nm ◼ Further wideband wavelength measurement options available ◼ Compliant with RoHS directives

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