We design and develop products that incorporate plasma functions and propose innovative process technologies.
The "Plasma Assist Source" is a plasma application product for semiconductor manufacturing processes. By adding plasma functionality, it is possible to enhance reactivity. Additionally, we design and develop products that add plasma functionality to existing process technologies, proposing innovative process technologies. 【Product Features】 ■ Plasma Cracking Cell - A cracking evaporation source for materials with high vapor pressure and poor directionality. - Activates sublimated materials and irradiates them onto the substrate through an orifice. ■ Plasma Source for ALD - Plasma source for ALD equipment, using oxygen or nitrogen. - Adjustable irradiation distance of 50 to 100 mm. - Excellent ON/OFF response speed and plasma stability. *For more details, please refer to the PDF document or feel free to contact us.
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【Other Product Features】 ■ Radical Source - Oxygen or nitrogen radical generation source - Generates high-frequency excited plasma indoors and irradiates a radical beam - Radical source for oxidation and nitridation thin film growth - Produces a highly efficient radical room *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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We manufacture and sell custom-made products that satisfy our customers. We also respond to various other requests.