Technical Data: Surface Modification of Polyethylene Using Vacuum Ultraviolet Excimer Lamp
Irradiation of vacuum ultraviolet light at a wavelength of 172 nm onto a polyethylene sheet! Experiment on surface modification.
In the late 1980s, a powerful vacuum ultraviolet light source utilizing dielectric barrier discharge, known as the xenon excimer lamp, was developed. The light obtained from this source at a wavelength of 172 nm has a high energy of 7.2 eV, enabling efficient photodissociation of various molecular bonds. As a result, the lamp has been put to practical use in applications such as the precision optical cleaning of glass substrates used in liquid crystal display panels, among various other applications. In this study, we examined the physical and chemical changes on the surface of polyethylene, a general-purpose resin that has low printability and adhesion, when exposed to vacuum ultraviolet light. [Contents] ■ Introduction ■ Experiment ■ Results and Discussion ■ Conclusion *For more details, please refer to the PDF document or feel free to contact us.
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Quark Technology Co., Ltd. manufactures and sells various industrial equipment using cutting-edge optical application technology. Through the development of vacuum ultraviolet and UV-LED light sources, we have introduced manufacturing technologies for semiconductors, new displays such as LCDs, PDPs, films, and EL, as well as various electronic materials and devices. Additionally, we are planning research and development to address the demand for waste and environmental management equipment, which are pressing medical and social issues. All matter is composed of atoms, nucleons, and "quarks." At Quark Technology, we continue to research light and challenge ourselves in industrial application technologies.
