Pressure gradient sputtering device capable of forming high-quality thin films through a high route.
The "PGS model" is a sputtering device capable of forming low damage, high-quality thin films through a high route.
The "PGS model" is a groundbreaking sputtering device that employs the pressure gradient phenomenon. It enables sputter deposition in a high vacuum environment. Additionally, it allows for the formation of low-damage, high-quality thin films through a high route. This product is the result of collaborative research with Kyushu University, Meijo University, and Okayama University of Science. 【Features】 ■ Utilizes the pressure gradient phenomenon ■ Enables sputter deposition in a high vacuum environment ■ Result of collaborative research with Kyushu University, Meijo University, and Okayama University of Science *For more details, please refer to the PDF document or feel free to contact us.
Inquire About This Product
basic information
【Technical Details (Partial)】 ■ Position of plasma gas introduction: Sputter cathode ■ Plasma density: High ■ Substrate to target distance: 150–200mm ■ Mean free path: Long ■ Plasma damage to substrate: Minimal, etc. *For more details, please refer to the PDF document or feel free to contact us.
Price range
Delivery Time
Applications/Examples of results
For more details, please refer to the PDF document or feel free to contact us.
catalog（1）
Download All Catalogs
Company information
We manufacture and sell custom-made products that satisfy our customers. We also respond to various other requests.
![[Patent] Achieving an air nozzle that completely removes water with air blow.](https://image.mono.ipros.com/public/product/image/2116982/IPROS16998950562973190030.png?w=280&h=280)