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  1. Home
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  3. Manufacturing and processing machinery
  4. Semiconductor Manufacturing Equipment
  5. Sputtering Equipment
  6. Multi-source RF sputtering device with glove box

Multi-source RF sputtering device with glove box

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last updated:Oct 06, 2022

ケニックス
ケニックス
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A research membrane environment that aims to eliminate oxygen and moisture! Supports multilayer membranes, compound membranes, and reactive membranes!

This product is a sputtering device for the development of batteries, catalyst materials, and organic devices. It connects a load lock chamber and a glove box to the sputtering chamber. It can accommodate four UHV-compatible sputter cathodes. Additionally, it supports multilayer films, compound film deposition, and reactive film deposition. 【Features】 ■ For the development of batteries, catalyst materials, and organic devices ■ Connects a load lock chamber and a glove box to the sputtering chamber ■ Can accommodate four UHV-compatible sputter cathodes ■ Research film deposition environment that eliminates oxygen and moisture ■ Supports multilayer films, compound film deposition, and reactive film deposition *For more details, please refer to the PDF document or feel free to contact us.

    Sputtering Equipment
2022-10-04_14h43_04.png

Multi-source RF sputtering device with glove box

2022-10-04_14h43_04.png
2022-10-04_14h43_04.png
  • Related Link - http://www.kenix.jp/product/spattaring.html

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【Specifications (Partial)】 ■ Sputter Cathode - Compatible with ultra-high vacuum - Low damage film deposition - Up to 4 sources can be installed ■ Substrate Holder - Substrate heating mechanism (normal use 800°C, compatible with oxidizing atmosphere) - Substrate rotation mechanism (motor rotation) - Substrate lifting mechanism (stroke 50mm) - Substrate bias application mechanism *Optional *For more details, please refer to the PDF document or feel free to contact us.

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ケニックス

ケニックス

Electronic Components and Semiconductors

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