Customizable to fit experimental purposes. Small RF sputtering device.
A compact RF sputtering device compatible with the production of metal films, as well as insulating films/oxide films. 【Features】 ○ Three types of chambers available to match sample sizes 〇 Cathode sizes compatible with 2, 4, and 6 inches 〇 The 2-inch cathode type also supports a three-source configuration ⇒ Enables the production of stacked films 〇 A variety of options available Substrate heating unit / Substrate cooling unit / MFC unit, etc.
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basic information
For details about the specifications, please contact us.
Price information
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Applications/Examples of results
【Applications】 ○ Electrode film attachment for various devices ○ Reflective thin film production applications, etc.
Line up（3）
| Model number | overview |
|---|---|
| SVC-700RF I | Dedicated for 2-inch cathode (depot down) Benchtop type small RF sputtering device (output 200W) |
| SVC-700RFII Type-I | Compatible with 2/4 inch cathodes *2-inch supports 3-source type RF sputtering device for research and development (output 300W) |
| SVC-700RFII Type-II | Model compatible with 6-inch cathodes RF sputtering device for research and development (output 300W) |
Company information
The management philosophy is to "pioneer the future of research and development with core technology." Our motto is to provide those involved in research and development with what they need at the right time, while enhancing the "expandability of device functions" and offering a "variety of options." Additionally, leveraging our "agility," we strive daily to meet the diverse needs of our customers.
