Electron beam lithography equipment, EUV exposure equipment, nanoimprint lithography applications. Two types available: powder and solution!
AQM's H-SiOx is a negative-type resist available in both powder and solution forms. It offers performance comparable to Dow XR-154 and FOX. Each form has its own characteristics. 【Powder】 Long-term storage possible: Can be stored for up to one year, allowing for gradual use over an extended period. Immediate availability: Can be obtained quickly when needed. Consistent viscosity: Does not thicken as it is mixed before use. Adjustable concentration: Capable of creating a wide range of film thicknesses tailored to applications. Highest level of line width: Achieves a line width of 7nm. 【Liquid】 Available for purchase in small quantities: Can be tailored to the required amount. Short delivery time: Delivery can be made within one month after order. Made to order: Can be delivered with a longer shelf life. Highest level of line width: Achieves a line width of 7nm. For inquiries, please contact our representative, Kitano.
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Electron beam lithography equipment, EUV exposure equipment, nanoimprint lithography applications.
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Electron beam lithography equipment, EUV exposure equipment, nanoimprint lithography applications.
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Optosirius is a technical trading company that imports and sells spectrometers, measuring instruments, and optical components. Our main products include compact spectrometers from Ocean Optics, which boasts one of the largest market shares in the world, and integrating spheres from Labsphere, which are considered the global standard. Additionally, we handle multi-spectral sensors/multi-spectral cameras, compact and high-speed data-acquisition color luminance meters, switches compatible with multi-mode optical fibers, materials such as quantum dots, and optical components like infrared detectors. A list of manufacturers we represent as authorized import agents, along with detailed information about each manufacturer's products, can be found on our website.
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