Presentation of explanatory materials on coating technology! About FCVA film formation technology.
Various functionalities can be imparted to the substrate surface! It is possible to obtain characteristics suited to applications such as improved sliding properties!
This document provides basic knowledge of coating technology and details about our "FCVA film formation technology." It explains hydrogen-free DLC coating using "PVD coating," as well as "CVD coating" and "FCVA film formation technology." Coatings can achieve properties suited to their applications, such as wear resistance, heat resistance, and improved sliding properties, depending on the materials used and the coating conditions. We invite you to read it. 【Contents】 ■ What is coating? ■ Types of coating - PVD coating - CVD coating ■ FCVA film formation technology ■ Hydrogen-free DLC coating - TAC - iTAC - STAR TAC ■ Fields of application *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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Applications/Examples of results
【Fields of Application】 ■ Surface treatment of automotive parts ■ Sliding parts of printers ■ Release films for precision molds ■ Coatings for ceramics and rubber ■ Coatings for tools *For more details, please refer to the PDF document or feel free to contact us.
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Our development technology has obtained international patents and plays a significant role in society. The super DLC (hydrogen-free ta-C film) produced by the FCVA method is formed through a completely different process compared to DLC films generated by existing PVD and CVD methods. Additionally, there is a composite metal film called "Micc film" that excels in release properties between metals and plastics. Coating films produced by the FCVA method are currently being rapidly adopted in fields such as the hard disk industry, precision machinery industry, and semiconductor industry, and future expansion into the automotive industry, nanoimprint industry, and biomaterials field is anticipated.
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