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  6. Glass Substrate Deposition System “Low Temperature Deposition” “Flexible Substrate Support”

Glass Substrate Deposition System “Low Temperature Deposition” “Flexible Substrate Support”

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last updated:May 08, 2025

M.WATANABE & CO.,LTD.
M.WATANABE & CO.,LTD.
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4.5 generation glass substrate deposition system for rigid/flexible devices such as FPD.

4.5 generation glass substrate deposition system for rigid/flexible devices such as FPD. 【Features】  ・Low temperature (150-300 degrees C) deposition  ・Deposition of 100 nm SiO2 film on 4.5 generation glass substrates at 250 degrees C with a throughput of 25 wafers/hour or more  ・Simple maintenance  ・Low CoO (low running cost)  ・High-quality SiO2 deposition formation: low stress, no plasma damage, small particles  ・Low installation and maintenance cost: small footprint, no need for vacuum or plasma     treatment 【Applications】  ・Insulating deposition for FPD (NSG)  ・Oxide semiconductor TFT passivation deposition (NSG) *For more details, please contact us or download the catalog to view.

    CVD Equipment
ガラス基板成膜装置_ipros.png

Glass Substrate Deposition System “Low Temperature Deposition” “Flexible Substrate Support”

ガラス基板成膜装置_ipros.png
ガラス基板成膜装置_ipros.png
  • Atmospheric Pressure CVD (APCVD) System
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Equipped with two gas heads with an effective deposition width of 760 mm and an adsorption-type heating stage achieving temperature controllability within ±3%. It is capable of depositing 100 nm SiO2 deposition on 4.5 generation glass substrates at 250 degrees C with a throughput of 25 wafers/hour or more, ensuring deposition thickness uniformity of less than 10%. ●System size (mm): 1300(W) x 7350(D) x 2000(H) ●Gases: SiH4, O3/O2, PH3, B2H6 ●Deposition temperature: 150-300 degrees C *For more details, please contact us or download the catalog to view.

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【Applications】 ・Insulating deposition for FPD (NSG) ・Oxide semiconductor TFT passivation deposition (NSG)

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M.WATANABE

M.WATANABE & CO.,LTD.

Electronic Components and Semiconductors

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Founded in 1930 as a specialized trading company for imports and exports, we celebrated our 90th anniversary in 2020 and are fully committed to the further development of the M.WATANABE Group. Since the mid-1960s, we have started manufacturing and selling our own products such as quartz processed products, silicone rubber molded products, and cleaning equipment, under the policy of selling silicon (Si) related products to the semiconductor industry. As a manufacturing trading company, we have grown alongside the IT society by providing high-quality products and services. Moving forward, we aim to create a company where employees of the group companies, centered around M.WATANABE & CO.,LTD., work vibrantly every day, and the entire workplace becomes a learning organization. We are determined to continue striving in all our business endeavors with a strong will to respond to the true needs of society. We sincerely ask for your continued support and patronage.

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