IPA vapor displaces moisture and dries the object. For 4 to 8-inch wafers. Can be installed into and docked to various cleaning tools.
Wafer drying system using IPA vapor. Stand-alone type and built-in type are available. 【Features】 ・IPA vapor drying system for 4-inch to 8-inch wafers ・Watermark free ・Can be installed into and docked to various cleaning tools ・Compatible with fine patterns ・High throughput *For more details, please contact us or download the catalog to view.
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basic information
This is a wafer drying device using IPA steam. We offer standalone and integrated cleaning machine models. ● Device size (standalone type) (mm): 800mm(W) x 900mm(D) x 950mm(H) ● Utilities: Three-phase AC200V, single-phase AC100V, organic exhaust, clean dry air, N2, cooling water ● Main safety equipment: CO2 fire extinguishing system, IPA gas concentration meter *For more details, please contact us or download the catalog to view.
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Applications/Examples of results
[Applications] - Drying of silicon wafers/MEMS/hard disks
Company information
Founded in 1930 as a specialized trading company for imports and exports, we celebrated our 90th anniversary in 2020 and are fully committed to the further development of the M.WATANABE Group. Since the mid-1960s, we have started manufacturing and selling our own products such as quartz processed products, silicone rubber molded products, and cleaning equipment, under the policy of selling silicon (Si) related products to the semiconductor industry. As a manufacturing trading company, we have grown alongside the IT society by providing high-quality products and services. Moving forward, we aim to create a company where employees of the group companies, centered around M.WATANABE & CO.,LTD., work vibrantly every day, and the entire workplace becomes a learning organization. We are determined to continue striving in all our business endeavors with a strong will to respond to the true needs of society. We sincerely ask for your continued support and patronage.