We propose fine processing technology for next-generation package substrates using KrF excimer lasers!
The "G300K" is a processing excimer laser light source that consolidates the technology and know-how obtained from our company's manufacturing of KrF excimer lasers for semiconductor lithography. In the semiconductor backend process, it enables processing on substrates that require small vias (10μm) and trench processing, and its application to advanced substrates is anticipated in the future. [Example of processable materials] Interlayer insulating materials / solder resist, among others.
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basic information
We achieve fine processing with high-power short-wavelength lasers. 【Laser Basic Performance】 ■ Short wavelength (248nm) ■ High power (300W) ■ High frequency (up to 4kHz)
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Detailed information
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【Laser Basic Performance】 ■Short Wavelength (248nm) ■High Power (300W) ■High Frequency (Up to 4kHz)
Company information
Since our establishment in 2000 as an advanced company supporting the semiconductor industry, we have continuously developed new excimer lasers for semiconductor lithography equipment. We will continue to challenge ourselves based on a global business strategy, prioritizing market needs in research and development, manufacturing, and technical support.
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