Rapid cooling mechanism after annealing! Introducing the high-speed heat treatment equipment from Annealsys.
The "AS-One 100/150" is an RTP device compatible with atmospheric and vacuum processes. It can be equipped with a turbo pump, and the mass flow controller can be up to 5. Please feel free to consult us when you need assistance. 【Features】 ■ Rapid cooling mechanism after annealing ■ Compatible with atmospheric and vacuum processes ■ Turbo pump can be installed ■ Mass flow controller: up to 5 *For more details, please refer to the PDF document or feel free to contact us.
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【Specifications】 ■AS-One 100 - Supports substrates up to 100mm in diameter - Maximum temperature: 1450℃ (lamp heating type from above the substrate) - Maximum heating rate: 200℃/second - Low temperature (1100℃) / high temperature (1450℃) pyrometer ■AS-One 150 - Supports substrates up to 150mm in diameter - Maximum temperature: 1300℃ (lamp heating type from above the substrate) - Maximum heating rate: 150℃/second - Low temperature (1100℃) / high temperature (1450℃) pyrometer *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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