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  6. Thick film ta-C "i-TAC"

Thick film ta-C "i-TAC"

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last updated:Jun 21, 2023

株式会社ナノフィルムテクノロジーズ ジャパン
株式会社ナノフィルムテクノロジーズ ジャパン
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Adjustable surface resistance! Suitable for components exposed to high loads and wear environments.

We would like to introduce our thick DLC film (over 5 microns) called 'i-TAC'. It demonstrates excellent wear resistance and adhesion, making it suitable for components exposed to high loads and wear environments. A dry process under vacuum conditions is possible. Please feel free to contact us if you have any inquiries. 【Features】 ■ Excellent adhesion to substrates ■ Dry process under vacuum ■ Excellent adhesion to substrates ■ Room temperature coating ■ Ultra-low friction coefficient ■ High wear resistance *You can download the English version of the catalog. *For more details, please refer to the PDF document or feel free to contact us.

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Thick film ta-C "i-TAC"

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  • Related Link - https://www.nanofilm.co.jp/tech/itac

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*You can download the English version of the catalog. *For more details, please refer to the PDF document or feel free to contact us.

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【Usage】 ■Components exposed to high loads and wear environments *You can download the English version of the catalog. *For more details, please refer to the PDF materials or feel free to contact us.

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Thick film ta-C "i-TAC"

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株式会社ナノフィルムテクノロジーズ ジャパン

株式会社ナノフィルムテクノロジーズ ジャパン

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Our development technology has obtained international patents and plays a significant role in society. The super DLC (hydrogen-free ta-C film) produced by the FCVA method is formed through a completely different process compared to DLC films generated by existing PVD and CVD methods. Additionally, there is a composite metal film called "Micc film" that excels in release properties between metals and plastics. Coating films produced by the FCVA method are currently being rapidly adopted in fields such as the hard disk industry, precision machinery industry, and semiconductor industry, and future expansion into the automotive industry, nanoimprint industry, and biomaterials field is anticipated.

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