Patterns are recorded in photosensitive materials! There is no need for masks or scanning processes.
"Interference Lithography" is a method that can form microstructures over a wide area through a parallel process (interference between two laser beams). The UV laser split by a splitter is magnified and exposed to form interference fringes. Additionally, by rotating the substrate to adjust the interference of the laser, it is possible to change the shape of the desired pattern, eliminating the need for masks or scanning processes. [Features] - Forms microstructures over a wide area through a parallel process - Magnifies and exposes the UV laser split by a splitter to form interference fringes - Patterns are recorded on photosensitive materials *For more details, please refer to the related links or feel free to contact us.
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Our company was established in Singapore in 1995 as a developer and processor of functional films, utilizing advanced expertise and a global network to provide innovative solutions. Please feel free to contact us if you have any inquiries.